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Water quality area

Chang-Shin E&P is a company that specializes in environment and facility plant
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Device’s principle

This is the device that produces pure by discharging by filling up the strongly acidic positive and negative ion exchange resin and strong alkalinity negative ion exchange resin within the independent tower when it comes to the filtered water in which at least 95% of the SS in the water and ion component was removed by having the RO filtering membrane pass through. Positive and negative ion exchange resin is regenerated with 5~10% (hydrochloric acid (HC) and negative ion exchange resin is regenerated with 3~8% caustic soda (NaOH). Meanwhile, resin with decreased ion exchange capability needs to be regenerated.

Reaction principle

Pure production

R(-SO3H)2 + Ca(HCO3)2R(-SO3H)2 + 2H2CO3

R-SO3H + NaClR-SO3Na + HCl

R=NOH + H2CO3R=NHCO3 +H2O

R=NOH + HClR=NCI + H2O

R=NOH + H2SiO3R=NHSiO3 + H2O

R(=NOH)2 + CA(HCO3)2R(=NHCO3)2 + CA(OH)2

R=NOH + NaClR=NCI + NaOH

R(-SO3H)2 + Ca(OH)2R(-SO3)2CA + 2H2O

R-SO3H + NaOHR-SO3H + NaOH

Regeneration response

R(-SO3)2 Ca+ 2HClR(-SO3H)2 + CaCl2

R-SO3Na + HClR-SO3H + NaCl

R=NHCO3 + NaOHR=NOH + NaHCO3

R=NHSiO3 + 2NaOHR=NOH + NaSiO3 + H2O

Usage
Semiconductor cleansing water, ultra-pure production’s post-treatment, plating water, Electro painting water, pharmaceutical, and industrial water for photo

Processing Unit
and standard

처리수량 및 규격
Model No. Flow Rate
(㎥/hr)
Diameter
(Ø)
Height
(H)
Pipe
(mm)
ION EXCHANGE RESIN (L) Note
Cation Anion
CHS-U20 2 200 1830 15 10 20  
CHS-U30 3 300 1830 15 20 40
CHS-U40 4 435 1830 25 50 100
CHS-U50 5 580 2440 32 100 200
CHS-U100 10 770 2745 50 200 400
CHS-U150 15 960 2745 65 300 600
CHS-U250 25 1200 2745 80 500 1000

※ 1㎲Recycle with forced injection method based on HCI, NaOH pump injection in case of (for semiconductor cleansing) abnormality.